Influence of deposition pressure on properties of ZnO: Al films fabricated by RF magnetron sputtering
Crossref DOI link: https://doi.org/10.1007/s11595-016-1518-1
Published Online: 2016-12-21
Published Print: 2016-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Liu, Chaoying
He, Feng
Yan, Ningning
Zang, Shuguang
Zuo, Yan
Ma, Juanrong
License valid from 2016-12-01