Effects of Rapid Thermal Annealing on Electrical Transport in Heavily Doped ZnO Thin Films Deposited at Different Substrate Temperatures
Crossref DOI link: https://doi.org/10.1007/s11664-014-3254-7
Published Online: 2014-07-22
Published Print: 2014-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhu, Ke
Yang, Ye
Huang, Jinhua
Lu, Yuehui
Li, Jia
Tan, Ruiqin
Cui, Ping
Song, Weijie
Text and Data Mining valid from 2014-07-22