Ultra-low Contact Resistivity of PtHf Silicide Utilizing Dopant Segregation Process
Crossref DOI link: https://doi.org/10.1007/s11664-016-5002-7
Published Online: 2016-10-20
Published Print: 2016-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ohmi, Shun-ichiro
Chen, Mengyi
Masahiro, Yasushi
License valid from 2016-10-20