Large-Area Direct Hetero-Epitaxial Growth of 1550-nm InGaAsP Multi-Quantum-Well Structures on Patterned Exact-Oriented (001) Silicon Substrates by Metal Organic Chemical Vapor Deposition
Crossref DOI link: https://doi.org/10.1007/s11664-017-5887-9
Published Online: 2017-11-02
Published Print: 2018-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Megalini, Ludovico
Cabinian, Brian C.
Zhao, Hongwei
Oakley, Douglas C.
Bowers, John E.
Klamkin, Jonathan
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