Structural and plasma characterization of the power effect on the chromium thin film deposited by DC magnetron sputtering
Crossref DOI link: https://doi.org/10.1007/s11801-020-9158-2
Published Online: 2020-08-18
Published Print: 2020-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Salo, S. Alsheikh
Abdallah, B.
Akel, M.
Kakhia, M.
Text and Data Mining valid from 2020-08-18
Version of Record valid from 2020-08-18
Article History
Received: 26 September 2019
Revised: 6 November 2019
First Online: 18 August 2020