Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether
Crossref DOI link: https://doi.org/10.1007/s11814-021-0987-x
Published Online: 2022-01-06
Published Print: 2022-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
You, Sanghyun
Kim, Jun-Hyun
Kim, Chang-Koo
Text and Data Mining valid from 2022-01-01
Version of Record valid from 2022-01-01
Article History
Received: 29 September 2021
Revised: 14 October 2021
Accepted: 18 October 2021
First Online: 6 January 2022