A modified high-temperature vapour deposition technique for fabricating $$\hbox {CH}_{3}\hbox {NH}_{3}\hbox {PbI}_{3}$$ thin films under an ambient atmosphere
Crossref DOI link: https://doi.org/10.1007/s12034-019-1956-4
Published Online: 2019-09-26
Published Print: 2019-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Manobalaji, G
Pandiyarajan, M
Senthilkumar, M
Babu, S Moorthy
Text and Data Mining valid from 2019-09-26
Version of Record valid from 2019-09-26
Article History
Received: 15 October 2018
Accepted: 26 March 2019
First Online: 26 September 2019