Correlation between optical emission spectra and the process parameters of a 915 MHz microwave plasma CVD reactor used for depositing polycrystalline diamond coatings
Crossref DOI link: https://doi.org/10.1007/s12046-014-0265-2
Published Online: 2014-07-03
Published Print: 2014-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
MALLIK, AWADESH KUMAR
BYSAKH, SANDIP
DUTTA, SOMESWAR
BASU, DEBABRATA
Text and Data Mining valid from 2014-07-03