A universal etching-free transfer of MoS2 films for applications in photodetectors
Crossref DOI link: https://doi.org/10.1007/s12274-015-0866-z
Published Online: 2015-10-12
Published Print: 2015-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ma, Donglin
Shi, Jianping
Ji, Qingqing
Chen, Ke
Yin, Jianbo
Lin, Yuanwei
Zhang, Yu
Liu, Mengxi
Feng, Qingliang
Song, Xiuju
Guo, Xuefeng
Zhang, Jin
Zhang, Yanfeng
Liu, Zhongfan
Text and Data Mining valid from 2015-10-12