Microstructuring of carbon/tin quantum dots via a novel photolithography and pyrolysis-reduction process
Crossref DOI link: https://doi.org/10.1007/s12274-017-1587-2
Published Online: 2017-06-24
Published Print: 2017-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Hong, Xufeng
He, Liang
Ma, Xinyu
Yang, Wei
Chen, Yiming
Zhang, Lei
Yan, Haowu
Li, Zhaohuai
Mai, Liqiang
License valid from 2017-06-24