Deep-elliptical-silver-nanowell arrays (d-EAgNWAs) fabricated by stretchable imprinting combining colloidal lithography: A highly sensitive plasmonic sensing platform
Crossref DOI link: https://doi.org/10.1007/s12274-019-2302-2
Published Online: 2019-02-01
Published Print: 2019-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Liu, Xueyao
Liu, Wendong
Yang, Bai
Text and Data Mining valid from 2019-02-01
Article History
Received: 23 August 2018
Revised: 16 January 2019
Accepted: 16 January 2019
First Online: 1 February 2019