A simple approach for an ultra-precise patterning using deep x-ray lithography with a micron-patterned x-ray mask
Crossref DOI link: https://doi.org/10.1007/s12541-014-0604-6
Published Online: 2014-11-28
Published Print: 2014-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, Jong Hyun
Chang, Suk Sang
Lim, Geunbae
Text and Data Mining valid from 2014-11-01