Characteristic Study of Silicon Nitride Films Deposited by LPCVD and PECVD
Crossref DOI link: https://doi.org/10.1007/s12633-018-9791-6
Published Online: 2018-04-13
Published Print: 2018-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yang, Chris
Pham, John
Text and Data Mining valid from 2018-04-13
Article History
Received: 2 February 2016
Accepted: 28 February 2018
First Online: 13 April 2018