Study of Linearity Performance of Graded Channel Gate Stacks Double Gate MOSFET with Respect to High-K Oxide Thickness
Crossref DOI link: https://doi.org/10.1007/s12633-019-00257-8
Published Online: 2019-08-30
Published Print: 2020-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Swain, Sanjit Kumar
Das, Satish Kumar
Adak, Sarosij http://orcid.org/0000-0001-6027-6525
Text and Data Mining valid from 2019-08-30
Version of Record valid from 2019-08-30
Article History
Received: 11 June 2019
Accepted: 22 August 2019
First Online: 30 August 2019