Electrical properties of HfO2 high-k thin-film MOS capacitors for advanced CMOS technology
Crossref DOI link: https://doi.org/10.1007/s12648-015-0691-y
Published Online: 2015-04-24
Published Print: 2015-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Khairnar, A. G.
Patil, L. S.
Salunke, R. S.
Mahajan, A. M.
Text and Data Mining valid from 2015-04-24