Induced transition from Schottky to ohmic contact in In/n-type Si owing to (NH4)2Sx treatment
Crossref DOI link: https://doi.org/10.1007/s12648-021-02235-6
Published Online: 2022-01-17
Published Print: 2022-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lin, Xiu-Yu
Chang, Hsing-Cheng
Huang, Bo-Lin
Lin, Yow-Jon http://orcid.org/0000-0001-7225-1341
Funding for this research was provided by:
Ministry of Science and Technology, Taiwan (109-2112-M-018-005)
Text and Data Mining valid from 2022-01-17
Version of Record valid from 2022-01-17
Article History
Received: 18 May 2021
Accepted: 26 October 2021
First Online: 17 January 2022