Effect of plating temperature on electroless amorphous Ni–P film on Si wafers in an alkaline bath solution
Crossref DOI link: https://doi.org/10.1007/s13204-017-0575-x
Published Online: 2017-07-01
Published Print: 2017-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wu, Wang-ping
Jiang, Jin-jin
License valid from 2017-07-01