High-conductivity SiO2-matrix B-doped Si-NC thin films by following ion-beam treatment
Crossref DOI link: https://doi.org/10.1007/s13391-016-6135-9
Published Online: 2016-09-09
Published Print: 2016-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Huang, Junjun
Wang, Weiyan
Yang, Jie
Tan, Yongzhen
Chen, Wei
Ge, Tianyu
Zhang, Yajun
Gao, Min
Chen, Zhenming
License valid from 2016-09-09