Study on the impact of silicon doping level on the trench profile using metal-assisted chemical etching
Crossref DOI link: https://doi.org/10.1007/s13391-016-6197-8
Published Online: 2016-10-08
Published Print: 2016-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Cao, Zhe
Huang, Qiyu
Zhao, Chuanrui
Zhang, Qing
License valid from 2016-10-08