Chlorine‐Based High Density Plasma Etching of α-Ga2O3 Epitaxy Layer
Crossref DOI link: https://doi.org/10.1007/s13391-020-00267-4
Published Online: 2021-02-01
Published Print: 2021-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Um, Ji Hun
Choi, Byoung Su
Jeong, Dae Hwi
Choi, Hyun-Ung
Hwang, Sungu
Jeon, Dae-Woo
Kim, Jin Kon
Cho, Hyun
Text and Data Mining valid from 2021-02-01
Version of Record valid from 2021-02-01
Article History
Received: 23 November 2020
Accepted: 27 December 2020
First Online: 1 February 2021