Effect of Aluminum Doping on the Nanocrystalline ZnS:Al3+ Films Fabricated on Heavily-Doped p-type Si(100) Substrates by Chemical Bath Deposition Method
Crossref DOI link: https://doi.org/10.1007/s13538-015-0323-1
Published Online: 2015-04-21
Published Print: 2015-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhu, He-Jie
Liang, Yan
Gao, Xiao-Yong
Guo, Rui-Fang
Ji, Qiang-Min
Text and Data Mining valid from 2015-04-21