Preparation and Characterization of Al-doped Tantalum Nitride Thin Films: Effect of Dopant Content and Film Thickness
Crossref DOI link: https://doi.org/10.1007/s13538-023-01277-x
Published Online: 2023-04-13
Published Print: 2023-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Gholami, M.
Khojier, K. http://orcid.org/0000-0003-3373-9250
Monsefi, Mehrdad
Borghei, Seyed Majid
Text and Data Mining valid from 2023-04-13
Version of Record valid from 2023-04-13
Article History
Received: 24 November 2022
Accepted: 20 February 2023
First Online: 13 April 2023
Declarations
:
: The authors declare no competing interests.