Dependence of the sputtering pressure on the characteristics of sputtered ZnO:Al thin films
Crossref DOI link: https://doi.org/10.1007/s40042-022-00418-w
Published Online: 2022-01-26
Published Print: 2022-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kim, Deok Kyu
Text and Data Mining valid from 2022-01-26
Version of Record valid from 2022-01-26
Article History
Received: 5 October 2021
Revised: 22 November 2021
Accepted: 6 December 2021
First Online: 26 January 2022