Obtaining Atomically Smooth 4H–SiC (0001) Surface by Controlling Balance Between Anodizing and Polishing in Electrochemical Mechanical Polishing
Crossref DOI link: https://doi.org/10.1007/s41871-019-00043-5
Published Online: 2019-06-13
Published Print: 2019-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yang, Xu
Yang, Xiaozhe
Sun, Rongyan
Kawai, Kentaro
Arima, Kenta
Yamamura, Kazuya
Text and Data Mining valid from 2019-06-13
Version of Record valid from 2019-06-13
Article History
Received: 26 April 2019
Revised: 23 May 2019
Accepted: 25 May 2019
First Online: 13 June 2019