Investigation on the Relaxation Time Response of Metal Capped Amorphous Oxide Si–In–Zn–O Thin Film Transistors
Crossref DOI link: https://doi.org/10.1007/s42341-021-00335-y
Published Online: 2021-05-06
Published Print: 2021-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lee, Sang Yeol http://orcid.org/0000-0002-6351-2156
Text and Data Mining valid from 2021-05-06
Version of Record valid from 2021-05-06
Article History
Received: 26 January 2021
Revised: 9 April 2021
Accepted: 21 April 2021
First Online: 6 May 2021