Improvement of electrostatic damage resistance of photomasks with conductive ITO film fabricated using UAPS (UV-Assisted-Partial-Strip) method
Crossref DOI link: https://doi.org/10.1007/s43207-021-00138-0
Published Online: 2021-09-10
Published Print: 2021-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
In, Jangsik
Jin, Byoungkyu
Jeong, Dae-Yong http://orcid.org/0000-0002-6022-938X
Text and Data Mining valid from 2021-09-01
Version of Record valid from 2021-09-01
Article History
Received: 20 April 2021
Revised: 5 August 2021
Accepted: 25 August 2021
First Online: 10 September 2021