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Author Correction: Graphene-driving strain engineering to enable strain-free epitaxy of AlN film for deep ultraviolet light-emitting diode

Crossref DOI link: https://doi.org/10.1038/s41377-022-00802-y

Published Online: 2022-04-29

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Chang, Hongliang

Liu, Zhetong

Yang, Shenyuan

Gao, Yaqi

Shan, Jingyuan

Liu, Bingyao

Sun, Jingyu https://orcid.org/0000-0002-9812-3046
Chen, Zhaolong

Yan, Jianchang https://orcid.org/0000-0002-7026-1711
Liu, Zhiqiang

Wang, Junxi

Gao, Peng https://orcid.org/0000-0001-9868-2115
Li, Jinmin

Liu, Zhongfan

Wei, Tongbo https://orcid.org/0000-0002-1479-082X
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First Online: 29 April 2022