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Multiple-patterning colloidal lithography-implemented scalable manufacturing of heat-tolerant titanium nitride broadband absorbers in the visible to near-infrared

Crossref DOI link: https://doi.org/10.1038/s41378-020-00237-8

Published Online: 2021-03-02

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Lee, Dasol

Go, Myeongcheol https://orcid.org/0000-0003-1473-0760
Kim, Minkyung

Jang, Junho

Choi, Chungryong

Kim, Jin Kon https://orcid.org/0000-0002-3872-2004
Rho, Junsuk https://orcid.org/0000-0002-2179-2890
Funding

Funding for this research was provided by:

National Research Foundation of Korea (NRF-2019R1A2C3003129)

National Research Foundation of Korea (CAMM-2019M3A6B3030637)

National Research Foundation of Korea (NRF-2019R1A5A8080290)

National Research Foundation of Korea (NRF-2018M3D1A1058997)

National Research Foundation of Korea (NRF-2017H1A2A1043204)

National Research Foundation of Korea (NRF-2013R1A3A2042196)
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Article History

Received: 1 September 2020

Revised: 19 November 2020

Accepted: 29 December 2020

First Online: 2 March 2021

Conflict of interest

: The authors declare that they have no conflict of interest.

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