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Multi-level patterning nucleic acid photolithography

Crossref DOI link: https://doi.org/10.1038/s41467-019-11670-3

Published Online: 2019-08-23

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Hölz, Kathrin https://orcid.org/0000-0001-9089-2417
Schaudy, Erika https://orcid.org/0000-0002-2803-6684
Lietard, Jory https://orcid.org/0000-0003-4523-6001
Somoza, Mark M. https://orcid.org/0000-0002-8039-1341
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Text and Data Mining valid from 2019-08-23

Version of Record valid from 2019-08-23
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Article History

Received: 29 April 2019

Accepted: 24 July 2019

First Online: 23 August 2019

Competing interests

: The authors declare no competing interests.