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Authors
Chen, Yifan
Hung, Siu Fai
Lo, Wing Ki http://orcid.org/0000-0002-8169-3827
Chen, Yang
Shen, Yang
Kafenda, Kim http://orcid.org/0000-0002-9101-7005
Su, Jia
Xia, Kangwei http://orcid.org/0000-0002-6971-5392
Yang, Sen http://orcid.org/0000-0003-1896-6092
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Article History
Received: 1 March 2020
Accepted: 29 September 2020
First Online: 21 October 2020
Competing interests
: Yf.C., S.F.H., K.X., S.Y. and The Chinese University of Hong Kong have filed a patent application related to the photon-induced material deposition (European Patent Application no. 19218640.1).
