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Ultra-high precision nano additive manufacturing of metal oxide semiconductors via multi-photon lithography

Published Online: 2024-10-25

Authors

Cao, Chun https://orcid.org/0000-0002-7332-073X
Xia, Xianmeng

Shen, Xiaoming

Wang, Xiaobing

Yang, Zhenyao

Liu, Qiulan

Ding, Chenliang

Zhu, Dazhao

Kuang, Cuifang https://orcid.org/0000-0002-7650-0349
Liu, Xu https://orcid.org/0000-0003-3982-3197
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Text and Data Mining valid from 2024-10-25

Version of Record valid from 2024-10-25
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Article History

Received: 21 March 2024

Accepted: 25 September 2024

First Online: 25 October 2024

Competing interests

: The authors declare no competing interests.

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