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12-inch growth of uniform MoS2 monolayer for integrated circuit manufacture

Crossref DOI link: https://doi.org/10.1038/s41563-023-01671-5

Published Online: 2023-09-28

Published Print: 2023-11

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Xia, Yin

Chen, Xinyu

Wei, Jinchen https://orcid.org/0009-0004-4444-4225
Wang, Shuiyuan https://orcid.org/0000-0002-1979-7430
Chen, Shiyou https://orcid.org/0000-0002-4039-8549
Wu, Simin

Ji, Minbiao

Sun, Zhengzong https://orcid.org/0000-0002-3710-4001
Xu, Zihan https://orcid.org/0000-0002-5632-0439
Bao, Wenzhong https://orcid.org/0000-0002-3871-467X
Zhou, Peng https://orcid.org/0000-0002-7301-1013
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Text and Data Mining valid from 2023-09-28

Version of Record valid from 2023-09-28
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Article History

Received: 13 July 2022

Accepted: 23 August 2023

First Online: 28 September 2023

Competing interests

: The authors declare no competing interests.