Customized binary and multi-level HfO2−x-based memristors tuned by oxidation conditions
Crossref DOI link: https://doi.org/10.1038/s41598-017-09413-9
Published Online: 2017-08-30
Update policy: https://doi.org/10.1007/springer_crossmark_policy
He, Weifan
Sun, Huajun
Zhou, Yaxiong
Lu, Ke
Xue, Kanhao
Miao, Xiangshui
Text and Data Mining valid from 2017-08-30
Version of Record valid from 2017-08-30
Article History
Received: 18 May 2017
Accepted: 24 July 2017
First Online: 30 August 2017
Competing Interests
: The authors declare that they have no competing interests.