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Electron irradiation induced amorphous SiO2 formation at metal oxide/Si interface at room temperature; electron beam writing on interfaces

Published Online: 2018-02-01

Authors

Gurbán, S.

Petrik, P.

Serényi, M.

Sulyok, A

Menyhárd, M. https://orcid.org/0000-0003-4581-5337
Baradács, E.

Parditka, B.

Cserháti, C.

Langer, G. A.

Erdélyi, Z.
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Text and Data Mining valid from 2018-02-01

Version of Record valid from 2018-02-01
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Article History

Received: 13 November 2017

Accepted: 19 January 2018

First Online: 1 February 2018

Competing Interests

: The authors declare that they have no competing interests.

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