Fabrication of Stacked MoS2 Bilayer with Weak Interlayer Coupling by Reduced Graphene Oxide Spacer
Crossref DOI link: https://doi.org/10.1038/s41598-019-42446-w
Published Online: 2019-04-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Oh, Hye Min
Kim, Hyojung
Kim, Hyun
Jeong, Mun Seok
Text and Data Mining valid from 2019-04-11
Version of Record valid from 2019-04-11
Article History
Received: 4 February 2019
Accepted: 1 April 2019
First Online: 11 April 2019
Competing Interests
: The authors declare no competing interests.