Monolayer MoS2 field effect transistor with low Schottky barrier height with ferromagnetic metal contacts
Crossref DOI link: https://doi.org/10.1038/s41598-019-53367-z
Published Online: 2019-11-19
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Gupta, Sachin
Rortais, F.
Ohshima, R.
Ando, Y.
Endo, T.
Miyata, Y.
Shiraishi, M.
Text and Data Mining valid from 2019-11-19
Version of Record valid from 2019-11-19
Article History
Received: 26 April 2019
Accepted: 25 October 2019
First Online: 19 November 2019
Competing interests
: The authors declare no competing interests.