Nano-scale depth-varying recrystallization of oblique Ar+ sputtered Si(111) layers
Crossref DOI link: https://doi.org/10.1038/s41598-020-68873-8
Published Online: 2020-07-17
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Gupta, Divya
Umapathy, G. R.
Singhal, Rahul
Ojha, Sunil
Aggarwal, Sanjeev
Text and Data Mining valid from 2020-07-17
Version of Record valid from 2020-07-17
Article History
Received: 7 January 2020
Accepted: 16 June 2020
First Online: 17 July 2020
Competing interests
: The authors declare no competing interests.