Aluminum doped zinc oxide deposited by atomic layer deposition and its applications to micro/nano devices
Crossref DOI link: https://doi.org/10.1038/s41598-020-80880-3
Published Online: 2021-01-13
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Van Toan, Nguyen
Tuoi, Truong Thi Kim
Inomata, Naoki
Toda, Masaya
Ono, Takahito
Text and Data Mining valid from 2021-01-13
Version of Record valid from 2021-01-13
Article History
Received: 23 June 2020
Accepted: 28 December 2020
First Online: 13 January 2021
Competing interests
: The authors declare no competing interests.