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Thermal stability and diffusion characteristics of ultrathin amorphous carbon films grown on crystalline and nitrogenated silicon substrates by filtered cathodic vacuum arc deposition

Crossref DOI link: https://doi.org/10.1038/s41598-021-91903-y

Published Online: 2021-06-23

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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