Document is current

Any future updates will be listed below

Author Correction: Improved oxidation behavior of Hf0.11Al0.20B0.69 in comparison to Hf0.28B0.72 magnetron sputtered thin films

Crossref DOI link: https://doi.org/10.1038/s41598-024-75854-8

Published Online: 2024-10-24

Update policy: https://doi.org/10.1007/springer_crossmark_policy

About CrossMark