Self-aligned imprint lithography process for fabricating indium-gallium- zinc-oxide thin film transistor arrays
Crossref DOI link: https://doi.org/10.1038/s41598-025-31473-5
Published Online: 2025-12-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Na, Chang-Yun
No, Changjun
Cho, Sung Min
Text and Data Mining valid from 2025-12-08
Version of Record valid from 2026-01-12
Article History
Received: 22 September 2025
Accepted: 3 December 2025
First Online: 8 December 2025
Declarations
:
: The authors declare no competing interests.