Reactive co-sputter deposition of Ta-doped tungsten oxide thin films for water splitting application
Crossref DOI link: https://doi.org/10.1038/s41598-025-92008-6
Published Online: 2025-03-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Jafarpour, Samaneh
Naghshara, Hamid
Text and Data Mining valid from 2025-03-10
Version of Record valid from 2025-03-10
Article History
Received: 8 October 2024
Accepted: 25 February 2025
First Online: 10 March 2025
Declarations
:
: The authors declare no competing interests.