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Enhancing uniformity in HARC etching via edge bias voltage and structural impedance variations in a rectangular voltage waveform

Published Online: 2026-01-20

Authors

Park, Chanho

Cho, Jinill

Um, Junghwan

Kim, Taesung
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Text and Data Mining valid from 2026-01-20

Version of Record valid from 2026-02-11
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Article History

Received: 8 July 2025

Accepted: 12 January 2026

First Online: 20 January 2026

Declarations

:

: The authors declare no competing interests.

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