Crossmark

Channel and contact length scaling of two-dimensional transistors using composite metal electrodes

Published Online: 2025-05-12

Authors

Chen, Sifan

Wang, Shuiyuan https://orcid.org/0000-0002-1979-7430
Liu, Zizheng

Wang, Tanjun

Zhu, Yuyan

Wu, Haoqi

Liu, Chunsen https://orcid.org/0000-0003-0842-7503
Zhou, Peng https://orcid.org/0000-0002-7301-1013
License Information

Text and Data Mining valid from 2025-05-12

Version of Record valid from 2025-05-12
More Information

Article History

Received: 27 May 2024

Accepted: 7 April 2025

First Online: 12 May 2025

Competing interests

: The authors declare no competing interests.

Document is current