Wang, Xizheng https://orcid.org/0000-0003-4390-1733
Liu, Ning https://orcid.org/0000-0001-9079-9351
Huang, Zhennan
Yang, Ji https://orcid.org/0000-0003-3911-0816
Chen, Gang
Li, Boyang https://orcid.org/0000-0002-3154-329X
Xie, Ti https://orcid.org/0000-0003-2011-5123
Overa, Sean https://orcid.org/0000-0001-5164-1519
Brozena, Alexandra H https://orcid.org/0000-0002-5045-2123
Li, Tangyuan https://orcid.org/0009-0001-1232-0613
Mumtaz, Farhan https://orcid.org/0000-0001-5213-608X
Zhang, Bohong https://orcid.org/0000-0002-5574-8396
Lin, Ying
Li, Mingze
Mei, Bowen https://orcid.org/0000-0002-8651-5464
Li, Shuke
Huang, Jinsong https://orcid.org/0000-0002-0509-8778
Huang, Jie https://orcid.org/0000-0002-8659-2910
Jiao, Feng https://orcid.org/0000-0002-3335-3203
Gong, Cheng https://orcid.org/0000-0001-7714-6380
Wang, Guofeng https://orcid.org/0000-0001-8249-4101
Chi, Miaofang https://orcid.org/0000-0003-0764-1567
Takeuchi, Ichiro https://orcid.org/0000-0003-2625-0553
Ju, Yiguang https://orcid.org/0000-0002-5656-2075
Hu, Liangbing https://orcid.org/0000-0002-9456-9315
Funding for this research was provided by:
National Science Foundation (EEC-2330245)
National Science Foundation (DMR 1905572)
U.S. Department of Energy (ERKCZ55)
U.S. Department of Energy (DE-SC0020233)
Article History
Received: 10 October 2024
Accepted: 26 September 2025
First Online: 5 November 2025
Competing interests
: L.H. and X.W. filed a patent application with the title ‘Vapor deposition systems and methods, and nanomaterials formed by vapor deposition’ on 22 December 2022, international application no. WO2023122250A3. The remaining authors declare no competing interests.