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The reason why thin-film silicon grows layer by layer in plasma-enhanced chemical vapor deposition

Published Online: 2015-03-16

Authors

Kuwahara, Takuya

Ito, Hiroshi

Kawaguchi, Kentaro

Higuchi, Yuji

Ozawa, Nobuki

Kubo, Momoji
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Text and Data Mining valid from 2015-03-16

Version of Record valid from 2015-03-16
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Article History

Received: 21 November 2014

Accepted: 16 February 2015

First Online: 16 March 2015

Competing interests

: The authors declare no competing financial interests.

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