Micropatterning of TiO2 Thin Films by MOCVD and Study of Their Growth Tendency
Crossref DOI link: https://doi.org/10.1038/srep09319
Published Online: 2015-03-23
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Hwang, Ki-Hwan
Kang, Byung-Chang
Jung, Duk Young
Kim, Youn Jea
Boo, Jin-Hyo
Text and Data Mining valid from 2015-03-23
Version of Record valid from 2015-03-23
Article History
Received: 7 October 2014
Accepted: 5 January 2015
First Online: 23 March 2015
Competing interests
: The authors declare no competing financial interests.