CMOS compatible high-Q photonic crystal nanocavity fabricated with photolithography on silicon photonic platform
Crossref DOI link: https://doi.org/10.1038/srep11312
Published Online: 2015-06-18
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ooka, Yuta
Tetsumoto, Tomohiro
Fushimi, Akihiro
Yoshiki, Wataru
Tanabe, Takasumi
Text and Data Mining valid from 2015-06-18
Version of Record valid from 2015-06-18
Article History
Received: 11 February 2015
Accepted: 19 May 2015
First Online: 18 June 2015
Competing interests
: The authors declare no competing financial interests.