Fabrication of 3-nm-thick Si3N4 membranes for solid-state nanopores using the poly-Si sacrificial layer process
Crossref DOI link: https://doi.org/10.1038/srep14656
Published Online: 2015-10-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Yanagi, Itaru
Ishida, Takeshi
Fujisaki, Koji
Takeda, Ken-ichi
Text and Data Mining valid from 2015-10-01
Version of Record valid from 2015-10-01
Article History
Received: 3 March 2015
Accepted: 2 September 2015
First Online: 1 October 2015
Competing interests
: The authors declare no competing financial interests.