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A novel approach of chemical mechanical polishing using environment-friendly slurry for mercury cadmium telluride semiconductors

Published Online: 2016-03-01

Authors

Zhang, Zhenyu

Wang, Bo

Zhou, Ping

Guo, Dongming

Kang, Renke

Zhang, Bi
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Text and Data Mining valid from 2016-03-01

Version of Record valid from 2016-03-01
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Article History

Received: 8 January 2016

Accepted: 15 February 2016

First Online: 1 March 2016

Competing interests

: The authors declare no competing financial interests.

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